[P-2-11] Effectiveness of Titanium and Carbon capping layer in NiSi formation with Ni film deposited by Atomic Layer Deposition

C. M. Yang、S. W Yun、J. B. Ha、K. I. Na、H. I. Cho、H. B. Lee、J. H. Jeong、S. H. Hahm、S. H. Kong、J. H. Lee (1.School of Electrical Engineering and Computer Science, Kyungpook National University)

https://doi.org/10.7567/SSDM.2006.P-2-11