Thermally Stable Carbon-Doped Silicon Oxide Films Deposited at Room Temperature

Keisuke Yamaoka; Hideaki Kato; Daisuke Tsukiyama; Yuji Yoshizako; Yoshikazu Terai; Yasufumi Fujiwara

doi:https://doi.org/10.7567/SSDM.2006.P-2-3

[P-2-3] Thermally Stable Carbon-Doped Silicon Oxide Films Deposited at Room Temperature

Keisuke Yamaoka、Hideaki Kato、Daisuke Tsukiyama、Yuji Yoshizako、Yoshikazu Terai、Yasufumi Fujiwara (1.Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University)

https://doi.org/10.7567/SSDM.2006.P-2-3

2006 International Conference on Solid State Devices and Materials

[P-2-3] Thermally Stable Carbon-Doped Silicon Oxide Films Deposited at Room Temperature