[P-2-3] Thermally Stable Carbon-Doped Silicon Oxide Films Deposited at Room Temperature

Keisuke Yamaoka, Hideaki Kato, Daisuke Tsukiyama, Yuji Yoshizako, Yoshikazu Terai, Yasufumi Fujiwara (1.Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University)

https://doi.org/10.7567/SSDM.2006.P-2-3