[P-2-7] Characterization of pore sealing effect on trench sidewalls in porous low-k films by vapor adsorption in-situ spectroscopic ellipsometry

N. Hata, K. Koga, K. Sumiya, S. Takada, M. Tada, Y. Kawamoto, T. Kanayama (1.MIRAI- Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 2.Consortium for Advanced Semiconductor Materials and Related Technologies (CASMAT))

https://doi.org/10.7567/SSDM.2006.P-2-7