[P-2-7] Characterization of pore sealing effect on trench sidewalls in porous low-k films by vapor adsorption in-situ spectroscopic ellipsometry

N. Hata、K. Koga、K. Sumiya、S. Takada、M. Tada、Y. Kawamoto、T. Kanayama (1.MIRAI- Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST)、2.Consortium for Advanced Semiconductor Materials and Related Technologies (CASMAT))

https://doi.org/10.7567/SSDM.2006.P-2-7