Magnetically Damage-free Etching of MTJ Film for Future 0.24-μm-rule MRAMs

Tomonori Mukai; Norikazu Ohshima; Hiromitsu Hada; Seiji Samukawa

doi:https://doi.org/10.7567/SSDM.2006.P-4-13L

2006 International Conference on Solid State Devices and Materials

2006年9月12日〜 2006年9月15日
PACIFICO Yokohama, Yokohama, Japan

[P-4-13L] Magnetically Damage-free Etching of MTJ Film for Future 0.24-μm-rule MRAMs

Tomonori Mukai、Norikazu Ohshima、Hiromitsu Hada、Seiji Samukawa (1.System Devices Research Laboratories, NEC Corporation、2.Institute of Fluid Science, Tohoku University)

https://doi.org/10.7567/SSDM.2006.P-4-13L

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