[A-1-2] PMOSFET Vth Modulation Technique using Fluorine Treatment through ALD-TiN Suitable for CMOS Devices

K. Tai, S. Yamaguchi, K. Tanaka, T. Hirano, I. Oshiyama, S. Kazi, T. Ando, M. Nakata, M. Yamanaka, R. Yamamoto, S. Kanda, Y. Tateshita, H. Wakabayashi, Y. Tagawa, M. Tsukamoto, H. Iwamoto, M. Saito, N. Nagashima, S. Kadomura (1.Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation)

https://doi.org/10.7567/SSDM.2007.A-1-2