[A-9-1] Practical Solutions to Enhance EWF Tunability of Ni FUSI Gates on HfO2

X.P. Wang, J.J. Yang, H.Y. Yu, M.-F. Li, J.D. Chen, R.L. Xie, C.X. Zhu, A.Y. Du, P.C. Lim, Andy Lim, Y.Y. Mi, Doreen M.Y. Lai, W.Y. Loh, S. Biesemans, G.Q. Lo, D.-L. Kwong (1.SNDL, ECE Dept, National University of Singapore, 2.Institute of Microelectronics, 3.IMEC, 4.Dept. of Microelectronics, Fudan University, 5.Institute of Material Research and Engineering)

https://doi.org/10.7567/SSDM.2007.A-9-1