[A-9-1] Practical Solutions to Enhance EWF Tunability of Ni FUSI Gates on HfO2

X.P. Wang、J.J. Yang、H.Y. Yu、M.-F. Li、J.D. Chen、R.L. Xie、C.X. Zhu、A.Y. Du、P.C. Lim、Andy Lim、Y.Y. Mi、Doreen M.Y. Lai、W.Y. Loh、S. Biesemans、G.Q. Lo、D.-L. Kwong (1.SNDL, ECE Dept, National University of Singapore、2.Institute of Microelectronics、3.IMEC、4.Dept. of Microelectronics, Fudan University、5.Institute of Material Research and Engineering)

https://doi.org/10.7567/SSDM.2007.A-9-1