[C-1-5] Plasma-Enhanced ALD Ru Thin Films on PVD-TaN Films with Smooth Morphology at Low Temperature Using DER Ru Precursor

Kunitoshi Namba、Nobuki Hosoi、Nobuaki Tarumi、Hiroshi Shinriki、Shinichi Ogawa (1.Semiconductor Leading Edge Technologies, Inc.、2.ASM Japan K.K.)

https://doi.org/10.7567/SSDM.2007.C-1-5