[C-1-5] Plasma-Enhanced ALD Ru Thin Films on PVD-TaN Films with Smooth Morphology at Low Temperature Using DER Ru Precursor

Kunitoshi Namba, Nobuki Hosoi, Nobuaki Tarumi, Hiroshi Shinriki, Shinichi Ogawa (1.Semiconductor Leading Edge Technologies, Inc., 2.ASM Japan K.K.)

https://doi.org/10.7567/SSDM.2007.C-1-5