The Japan Society of Applied Physics

[C-10-1] Characterization of Line-edge Roughness in Cu/low-k Interconnect Pattern

Atsuko Yamaguchi, Daisuke Ryuzaki, Ken’ichi Takeda, Jiro Yamamoto, Hiroki Kawada, Takashi Iizumi (1.Central Research Laboratory, Hitachi Ltd., 2.Hitachi High-Technologies Corp.)

https://doi.org/10.7567/SSDM.2007.C-10-1