[C-3-2] Impact of Barrier Metal Sputtering on Low-k SiOCH Films with Various Chemical Structures

Naoya Inoue, Naoya Furutake, Fuminori Ito, Hironori Yamamoto, Tsuneo Takeuchi, Yoshihiro Hayashi (1.Device Platforms Research Labs., NEC)

https://doi.org/10.7567/SSDM.2007.C-3-2