[C-3-2] Impact of Barrier Metal Sputtering on Low-k SiOCH Films with Various Chemical Structures

Naoya Inoue、Naoya Furutake、Fuminori Ito、Hironori Yamamoto、Tsuneo Takeuchi、Yoshihiro Hayashi (1.Device Platforms Research Labs., NEC)

https://doi.org/10.7567/SSDM.2007.C-3-2