[C-3-3] Process Induced Damage Analysis of Low-k SiOCH Films Focusing on Siloxane Network and Methyl End Group

Shinichi Nakao、Keizo Kinoshita、Shinichi Ogawa (1.Research Dept. 2, Semiconductor Leading Edge Technologies, Inc. (Selete))

https://doi.org/10.7567/SSDM.2007.C-3-3