[C-5-2] Structural Study on CoFeB/MgO/CoFeB Magnetic Tunnel Junctions

K. Tsunekawa, Y. Choi, Y. Nagamine, H. Maehara, D. D. Djayaprawira, T. Takeuchi, Y. Kitamoto (1.Electronic Devices Engineering Headquarters, Canon ANELVA Corporation, 2.Dept. of Innovative and Engineered Materials, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.2007.C-5-2