[C-5-2] Structural Study on CoFeB/MgO/CoFeB Magnetic Tunnel Junctions

K. Tsunekawa、Y. Choi、Y. Nagamine、H. Maehara、D. D. Djayaprawira、T. Takeuchi、Y. Kitamoto (1.Electronic Devices Engineering Headquarters, Canon ANELVA Corporation、2.Dept. of Innovative and Engineered Materials, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.2007.C-5-2