[C-9-3] Properties of Methyl Boron Nitride Film for Next Generation Low-K Interconnection

S. Tokuyama, M. K. Mazumder, D. Watanabe, C. Kimura, H. Aoki, T. Sugino (1.Dept. of Electrical, Electronic and Information Engineering, Osaka University)

https://doi.org/10.7567/SSDM.2007.C-9-3