[C-9-3] Properties of Methyl Boron Nitride Film for Next Generation Low-K Interconnection

S. Tokuyama、M. K. Mazumder、D. Watanabe、C. Kimura、H. Aoki、T. Sugino (1.Dept. of Electrical, Electronic and Information Engineering, Osaka University)

https://doi.org/10.7567/SSDM.2007.C-9-3