[C-9-4] Effects of Silylation on Electrical and Mechanical Characteristics of Mesoporous Pure Silica Zeolite Films
T. Seo, T. Yoshino, N. Ohnuki, Y. Seino, N. Hata, T. Kikkawa
(1.Research Center for Nanodevices and Systems, Hiroshima University, 2.Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST))
https://doi.org/10.7567/SSDM.2007.C-9-4