Effects of Silylation on Electrical and Mechanical Characteristics of Mesoporous Pure Silica Zeolite Films

T. Seo; T. Yoshino; N. Ohnuki; Y. Seino; N. Hata; T. Kikkawa

doi:https://doi.org/10.7567/SSDM.2007.C-9-4

2007 International Conference on Solid State Devices and Materials

2007年9月18日〜 2007年9月21日
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[C-9-4] Effects of Silylation on Electrical and Mechanical Characteristics of Mesoporous Pure Silica Zeolite Films

T. Seo、T. Yoshino、N. Ohnuki、Y. Seino、N. Hata、T. Kikkawa (1.Research Center for Nanodevices and Systems, Hiroshima University、2.Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST))

https://doi.org/10.7567/SSDM.2007.C-9-4

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