Determination of mechanical properties of porous silica low-k films on Si substrates using orientation dependence of surface acoustic wave

Toshinori Takimura; Nobuhiro Hata; Syozo Takada; Takenobu Yoshino

doi:https://doi.org/10.7567/SSDM.2007.C-9-5

2007 International Conference on Solid State Devices and Materials

Sep 18, 2007 - Sep 21, 2007
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[C-9-5] Determination of mechanical properties of porous silica low-k films on Si substrates using orientation dependence of surface acoustic wave

Toshinori Takimura, Nobuhiro Hata, Syozo Takada, Takenobu Yoshino (1.Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Science and Technology (AIST))

https://doi.org/10.7567/SSDM.2007.C-9-5

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