[F-1-3] In situ Metal Mask for Selective Area Growth of Thin Epitaxial Layers

Shunsuke Ohkouchi, Nobuhiko Ozaki, Yoshiaki Takata, Yoshinori Kitagawa, Yusui Nakamura, Naoki Ikeda, Yoshimasa Sugimoto, Kiyoshi Asakawa (1.National Institute of Advanced Industrial Science and Technology (AIST), 2.NEC Corporation, Nano Electronics Research Laboratories, 3.University of Tsukuba, Center for TARA, 4.Kumamoto University, Graduate School of Science and Technology, 5.National Institute for Material Science (NIMS))

https://doi.org/10.7567/SSDM.2007.F-1-3