[F-2-4] Defect Passivation by Hydrogen in Zinc Oxide Films Grown by MOCVD
Jungyol Jo、Ogweon Seo、Hyoshik Choi、Byeonggon Lee
(1.Department of Electrical and Computer Engineering, Ajou University、2.NFC, Samsung Advanced Institute of Technology、3.CDA Co., Ltd.)
https://doi.org/10.7567/SSDM.2007.F-2-4