[F-3-4] Strain-Relaxed Si1-xGex and Strained Si Grown by Sputter Epitaxy

Hiroaki Hanafusa、Yoshiyuki Suda、Akifumi Kasamatsu、Nobumitsu Hirose、Takashi Mimura、Toshiaki Matsui (1.Graduate School of Engineering, Tokyo University of Agriculture and Technology、2.National Inst. of Information and Communications Technology)

https://doi.org/10.7567/SSDM.2007.F-3-4