[F-9-1] Advanced Characterization of High-k Gate Stack by Internal Photo Emission (IPE): Interfacial Dipole and Band Diagram in Al/Hf(Si)O2/Si MOS Structure

Julie Widiez、Koji Kita、Tomonori Nishimura、Akira Toriumi (1.Department of Materials Engineering, School of Engineering, The University of Tokyo)

https://doi.org/10.7567/SSDM.2007.F-9-1