Surface Treatment of Ge(001) Surface by Radical Nitridation.

Hiroki Kondo; Misato Fujita; Akira Sakai; Masaki Ogawa; Shigeaki Zaima

doi:https://doi.org/10.7567/SSDM.2007.F-9-5

[F-9-5] Surface Treatment of Ge(001) Surface by Radical Nitridation.

Hiroki Kondo、Misato Fujita、Akira Sakai、Masaki Ogawa、Shigeaki Zaima (1.Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University、2.EcoTopia Science Institute, Nagoya University、3.Present affiliation: Department of Systems Innovation, Graduate School of Engineering Science, Osaka University)

https://doi.org/10.7567/SSDM.2007.F-9-5

2007 International Conference on Solid State Devices and Materials

[F-9-5] Surface Treatment of Ge(001) Surface by Radical Nitridation.