[H-6-3] High quality Si1-xGex nanowire and its application to MOSFET integrated with HfO2/TaN/Ta gate stack

W. F. Yang、S. J. Lee、S. J. Whang、S. Y. Lim、B. J. Cho、D. L. Kwong (1.Silicon Nano Device Lab., Dept. of Electrical & Computer Engineering, National University of Singapore、2.Institute of Microelectronics)

https://doi.org/10.7567/SSDM.2007.H-6-3