[H-6-3] High quality Si1-xGex nanowire and its application to MOSFET integrated with HfO2/TaN/Ta gate stack

W. F. Yang, S. J. Lee, S. J. Whang, S. Y. Lim, B. J. Cho, D. L. Kwong (1.Silicon Nano Device Lab., Dept. of Electrical & Computer Engineering, National University of Singapore, 2.Institute of Microelectronics)

https://doi.org/10.7567/SSDM.2007.H-6-3