[J-3-2] ESR and PL Study of Charge Trapping Centers in Silicon Nitride Films and Its Verification with Novel ONO-Sidewall 2-bit/cell Nonvolatile Memory

Atsushi Toki, Noriaki Shinohara, Masayuki Nakano, Hiroshi Kotaki, Yoshiaki Kamigaki (1.Kagawa University, Dept. of Advanced Materials Science, Faculty of Engineering, 2.Sharp Corporation, Corporate Research and Development Group)

https://doi.org/10.7567/SSDM.2007.J-3-2