Real-time monitoring of initial oxidation of Si(110)-16×2 surface by Si2p Photoemission spectroscopy

Yoshihisa Yamamoto; Hideaki Togashi; Atsushi Kato; Satoshi Hasegawa; Seiiti Goto; Takuya Nakano; Maki Suemitsu; Yuzuru Narita; Akitaka Yoshigoe; Yuden Teraoka

doi:https://doi.org/10.7567/SSDM.2007.P-1-1

[P-1-1] Real-time monitoring of initial oxidation of Si(110)-16×2 surface by Si2p Photoemission spectroscopy

Yoshihisa Yamamoto, Hideaki Togashi, Atsushi Kato, Satoshi Hasegawa, Seiiti Goto, Takuya Nakano, Maki Suemitsu, Yuzuru Narita, Akitaka Yoshigoe, Yuden Teraoka (1.Center for Interdisciplinary Research,Tohoku University, 2.Kyushu Institute of Technology, 3.Synchrotron Radiation Research Center, Japan Atomic Energy Agency)

https://doi.org/10.7567/SSDM.2007.P-1-1

2007 International Conference on Solid State Devices and Materials

[P-1-1] Real-time monitoring of initial oxidation of Si(110)-16×2 surface by Si2p Photoemission spectroscopy