The Japan Society of Applied Physics

[P-1-17] Quantitative Characterization of Plasma-Induced Defect Generation Process in Exposed Thin Si Surface Layers

Koji Eriguchi、Akira Ohno、Daisuke Hamada、Masayuki Kamei、Hiroshi Fukumoto、Kouichi Ono (1.Graduate School of Engineering, Kyoto University)

https://doi.org/10.7567/SSDM.2007.P-1-17