[P-1-19] UV-VIS Raman Characterization of High Dose Ultra Shallow Implanted Silicon before and after Excessive Annealing

T. Sasaki、H. Minami、K. Kisoda、W. S. Yoo、M. Yoshimoto、H. Harima (1.Kyoto Institute of Technology、2.Wakayama University、3.WaferMasters, Inc.)

https://doi.org/10.7567/SSDM.2007.P-1-19