[P-1-8] Nanoscale-order Homogeneous Structure of SiO2 Film on Poly-silicon Grown at Room Temperature using UV Light Excited Ozone.

Naoto Kameda, Tetsuya Nishiguchi, Yoshiki Morikawa, Mitsuru Kekura, Hidehiko Nonaka, Shingo Ichumura (1.Meidensha Corporation, Core Technology Research Laboratories, 2.National Institute of Advanced Industrial Science and Technology (AIST))

https://doi.org/10.7567/SSDM.2007.P-1-8