Robust High-κ HfOxNy n-MOSFETs Using Low Work Function TbN Gate

Nai-Chao Su; Chien-Hung Wu; Shui-Jinn Wang; Chen-Kuo Chiang; Ching-Cheng Cheng

doi:https://doi.org/10.7567/SSDM.2007.P-1-9

2007 International Conference on Solid State Devices and Materials

2007年9月18日〜 2007年9月21日
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[P-1-9] Robust High-κ HfOxNy n-MOSFETs Using Low Work Function TbN Gate

Nai-Chao Su、Chien-Hung Wu、Shui-Jinn Wang、Chen-Kuo Chiang、Ching-Cheng Cheng (1.Institute of Microelectronics, Dept. of Electrical Eng.、2.National Cheng Kung Univ.)

https://doi.org/10.7567/SSDM.2007.P-1-9

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