[P-11-11] Novel inorganic pH-insensitive membrane prepared by post N2O plasma treatment on conventional Si3N4/SiO2 stack layer for REFET application

Ti-Chuan Wang, Tseng-Fu Lu, Chi-Hang Chin, Cheng-En Lue, Chia-Ming Yang, Yu-Ching Fang, Li Hsu, Hui-Chun Wang, Chao-Sung Lai (1.Department of Electronic Engineering, Chang Gung University, 2.Chung-Shan Institute of Science & Technology, Materials & Electro-Optics Research Division)

https://doi.org/10.7567/SSDM.2007.P-11-11