The Japan Society of Applied Physics

[P-2-9] Characterization of Patterned Oxide Buried in Bonded Silicon-on-Insulator Wafers by Near-Infrared Scattering Topography and Microscopy

Xing Wu, Junichi Uchikoshi, Takaaki Hirokane, Ryuta Yamada, Kenta Arima, Mizuho Morita (1.Department of Precision Science and Technology, School of Engineering, Osaka University, 2.School of Electronics and Information Engineering, Xi’an Jiaotong University)

https://doi.org/10.7567/SSDM.2007.P-2-9