[P-8-19L] Large Grain Poly-crystalline Si Films by Carbon Dioxide Laser Assisted SLG Method

Hiroshi Tsunazawa、Yoshihiro Taniguchi、Shinya Okazaki、Masanori Seki、Yasuhito Otsuka、Hiroaki Takeuchi、Masaya Okamoto、Junichiro Nakayama (1.Production Technology Development Group, SHARP Corporation、2.International Business Group, SHARP Laboratories of America Inc.)

https://doi.org/10.7567/SSDM.2007.P-8-19L