[P-9-12] Dopant Dependency of Nickel Silicide and Its Improvement Utilizing Ni-Pd (5%) on SOI Substrate for Nano-scale CMOSFET

Soon-Yen Jung、Ying-Ying Zhang、Zhun Zhong、Shi-Guang Li、Kee-Young Park、Yeong-Cheol Kim、Ga-Won Lee、Jin-Suk Wang、Hi-Deok Lee (1.Dept. of Electronics Engineering, Chungnam National University、2.Dept. of Materials Eng., Korea University of Technology and Education)

https://doi.org/10.7567/SSDM.2007.P-9-12