The Japan Society of Applied Physics

[P-9-12] Dopant Dependency of Nickel Silicide and Its Improvement Utilizing Ni-Pd (5%) on SOI Substrate for Nano-scale CMOSFET

Soon-Yen Jung, Ying-Ying Zhang, Zhun Zhong, Shi-Guang Li, Kee-Young Park, Yeong-Cheol Kim, Ga-Won Lee, Jin-Suk Wang, Hi-Deok Lee (1.Dept. of Electronics Engineering, Chungnam National University, 2.Dept. of Materials Eng., Korea University of Technology and Education)

https://doi.org/10.7567/SSDM.2007.P-9-12