[A-4-2] The dry etching process for patterning P(VDF-TeFE) thin film with various conditions

D. Terashima¹、J. H. Jeong¹、C. Kimura¹、H. Aoki¹ (1.Osaka Univ. , Japan)

https://doi.org/10.7567/SSDM.2010.A-4-2