[B-3-2] Oxygen vacancy mobility and diffusion coefficient determined from current measurements in SiO₂/HfO₂/TiN stacks

S. Zafar¹、H. Jagannathan¹、L. F. Edge¹、D. Gupta¹ (1.IBM , USA)

https://doi.org/10.7567/SSDM.2010.B-3-2