Robust Ultra-violet (UV) Analysis Technique for Band Diagram Extraction of Al/HfGdO/SiO<sub>2</sub>/p-Si Structure with Different Hf/Gd Dual-sputtered Ratio

P. C. Chou; J. C. Wang; C. S. Lai; J. Y. Lin; W. C. Chang; K. T. Chen; Y. C. Chung; Y. H. Lin; I. T. Wang; C. I. Wu; P. S. Wang

doi:https://doi.org/10.7567/SSDM.2010.B-5-3

[B-5-3] Robust Ultra-violet (UV) Analysis Technique for Band Diagram Extraction of Al/HfGdO/SiO₂/p-Si Structure with Different Hf/Gd Dual-sputtered Ratio

P. C. Chou¹、J. C. Wang¹、C. S. Lai¹、J. Y. Lin¹、W. C. Chang¹、K. T. Chen¹、Y. C. Chung¹、Y. H. Lin¹、I. T. Wang¹、C. I. Wu²、P. S. Wang² (1.Chang Gung Univ.、2.National Taiwan Univ. , Taiwan)

https://doi.org/10.7567/SSDM.2010.B-5-3

2010 International Conference on Solid State Devices and Materials

[B-5-3] Robust Ultra-violet (UV) Analysis Technique for Band Diagram Extraction of Al/HfGdO/SiO2/p-Si Structure with Different Hf/Gd Dual-sputtered Ratio

[B-5-3] Robust Ultra-violet (UV) Analysis Technique for Band Diagram Extraction of Al/HfGdO/SiO₂/p-Si Structure with Different Hf/Gd Dual-sputtered Ratio