[H-3-1] Crack-Free Epitaxial ZnO film on Si(111) with Gd₂O₃(Ga₂O₃) buffer layer

B. H. Lin^1,2, W. R. Liu^1,2, C. C. Kuo¹, C. H. Hsu^2,1, W. F. Hsieh^1,3, M. Hong⁴, J. Kwo⁴ (1.National Chiao Tung Univ., 2.National Synchrotron Radiation Research Center, 3.National Cheng Kung Univ., 4.National Tsing Hua Univ. , Taiwan)

https://doi.org/10.7567/SSDM.2010.H-3-1