[H-4-2] Plasma Discharge Condition Dependence of the Crystallographic Quality of Networked Nanographite Grown by the Photoemission-Assisted Plasma-Enhanced CVD

S. Ogawa^1,2, T. Kaga¹, Y. Ohtomo¹, M. Sato^2,3, M. Nihei^2,3, Y. Takakuwa^1,2 (1.Tohoku Univ., 2.CREST-JST, 3.Fujitsu Ltd. , Japan)

https://doi.org/10.7567/SSDM.2010.H-4-2