Advanced Organic Polymers for the Aggressive Scaling of Low-k Materials

M. Pantouvaki; L. Zhao; C. Huffman; N. Heylen; Y. Ono; M. Nakajima; K. Nakatani; G. P. Beyer; M. R. Baklanov

doi:https://doi.org/10.7567/SSDM.2010.H-5-1

2010 International Conference on Solid State Devices and Materials

2010年9月21日〜 2010年9月24日
The University of Tokyo, Tokyo, Japan

[H-5-1] Advanced Organic Polymers for the Aggressive Scaling of Low-k Materials

M. Pantouvaki¹、L. Zhao²、C. Huffman¹、N. Heylen¹、Y. Ono³、M. Nakajima³、K. Nakatani³、G. P. Beyer¹、M. R. Baklanov¹ (1.IMEC、2.Intel Corp. , Belgium、3.Sumitomo Bikelite Co., Ltd. , Japan)

https://doi.org/10.7567/SSDM.2010.H-5-1

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