[I-5-3] The Unique Phenomenon in the Amorphous In2O3-Ga2O3-ZnO TFTs Degradation under the Dynamic Stress
M. Fujii1, J. S. Jung2, J. Y. Kwon2, Y. Uraoka1,3
(1.NAIST , Japan, 2.Samsung Advanced Inst. of Tech. , Korea, 3.CREST-JST , Japan)
https://doi.org/10.7567/SSDM.2010.I-5-3