The Japan Society of Applied Physics

[I-6-5] Reduced contact resistance and Improved surface morphology for Ohmic Contacts on AlGaN/GaN based Semiconductors employing KrF Laser Irradiation

G. H. Wang1, T. Sudhiranjan1, X. Wang2, H. Y. Zheng2, T. K. Chan3, T. Osipowicz3, Y. L. Foo1 (1.Inst. of Materials Res. And Eng., 2.Singapore Inst. Of Manufacturing Tech., 3.National Univ. of Singapore , Singapore)