[K-7-1] Droplet elimination process by radical beam irradiation for the growth of InN-based III-nitrides and its application to device structure

T. Yamaguchi¹、Y. Nanishi^1,2 (1.Ritsumeikan Univ.、2.Seoul National Univ. , Korea)

https://doi.org/10.7567/SSDM.2010.K-7-1