Fabrication and in vivo Evaluation of High Performance Stimulus Electrodes Employed in a CMOS Chip for Retinal Prosthesis

T. Noda; S. Tomimatsu; K. Sasagawa; T. Tokuda; Y. Terasawa; K. Nishida; T. Fujikado; J. Ohta

doi:https://doi.org/10.7567/SSDM.2010.L-2-4

[L-2-4] Fabrication and in vivo Evaluation of High Performance Stimulus Electrodes Employed in a CMOS Chip for Retinal Prosthesis

T. Noda¹, S. Tomimatsu¹, K. Sasagawa¹, T. Tokuda¹, Y. Terasawa², K. Nishida³, T. Fujikado³, J. Ohta¹ (1.NAIST, 2.NIDEK Co., Ltd., 3.Osaka Univ. , Japan)

https://doi.org/10.7567/SSDM.2010.L-2-4

2010 International Conference on Solid State Devices and Materials

[L-2-4] Fabrication and in vivo Evaluation of High Performance Stimulus Electrodes Employed in a CMOS Chip for Retinal Prosthesis